2024-09-26 |
BANQ1060584304 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
2158.0 kg |
280800
|
NITRIC ACID EP-S 250KG |
2024-09-24 |
BANQ1060880444 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
65952.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-09-22 |
JSSYJSDW2408016 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
16438.0 kg |
|
ETCHANT |
2024-09-17 |
BANQ1060584182 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-09-17 |
BANQ1060880335 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
15342.0 kg |
392062
|
POLY ETCHANT 200L(SAS) |
2024-09-14 |
JSSYJSDW2408010 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
18912.0 kg |
293213
|
ISO PROPYL ALCOHOL ISO PROPYL ALCOHOL |
2024-09-08 |
BANQ1060880089 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
35174.0 kg |
|
ARF THINNER(RFM)200L(SAS) PHOTORESIST STRIPPER FOR |
2024-08-29 |
BANQ1060319273 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
15342.0 kg |
392062
|
POLY ETCHANT 200L(SAS) |
2024-08-29 |
BANQ1060582290 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
30778.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-08-25 |
JSSYJSDW2407024 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
18912.0 kg |
293213
|
ISO PROPYL ALCOHOL ISO PROPYL ALCOHOL |
2024-08-24 |
BANQ1060581977 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
21984.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-08-21 |
JSSYJSDW2406004 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
3520.0 kg |
480220
|
PHOTO RESIST STRIPPER |
2024-07-30 |
BANQ1060317786 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-07-30 |
BANQ1060316962 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
35174.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-07-27 |
BANQ1060408188 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
35174.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-07-24 |
JSSYJSDW2404018 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
35174.0 kg |
480220
|
PHOTO RESIST STRIPPERNEW ARF THINNER PHOTO RESIST STRIPPERNEW ARF THINNER |
2024-07-24 |
JSSYJSDW2404019 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
16438.0 kg |
|
ETCHANTPOLY ETCHANT |
2024-07-24 |
JSSYJSDW2404020 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
7305.0 kg |
|
ETCHANTMA-GT01MA-GSO2 |
2024-07-22 |
JSSYJSDW2406025 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
87935.0 kg |
480220
|
PHOTO RESIST STRIPPER PHOTO RESIST STRIPPER PHOTO RESIST STRIPPER PHOTO RESIST STRIPPER PHOTO RESIST STRIPPER |
2024-07-16 |
BANQ1060315440 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
35174.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-07-13 |
KWEO550141543301 |
SEH AMERICA |
20798.0 kg |
|
ETCHANT |
2024-07-08 |
BANQ1060217850 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
17587.0 kg |
|
ARF THINNER(RFM)200L(SAS) |
2024-07-04 |
BANQ1059231838 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-07-04 |
BANQ1059443672 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
87935.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-06-21 |
BANQ1059481219 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-06-19 |
BANQ1059934338 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
2158.0 kg |
280800
|
NITRIC ACID EP-S 250KG |
2024-06-19 |
BANQ1059883715 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
35174.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-06-16 |
BANQ1060291962 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
17587.0 kg |
|
ARF THINNER(RFM)200L(SAS) |
2024-06-14 |
BANQ1059442913 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
1759.0 kg |
291521
|
ACETIC ACID |
2024-06-14 |
BANQ1059443210 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
15342.0 kg |
392062
|
POLY ETCHANT 200L(SAS) |
2024-06-13 |
JSSYJSDW2405007 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
16438.0 kg |
|
ETCHANT |
2024-06-07 |
BANQ1059063720 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
87935.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-05-31 |
JSSYJSDW2405006 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
12447.0 kg |
854150
|
SEMICONDUCTOR CLEANER SEMICONDUCTOR CLEANER |
2024-05-30 |
BANQ1059884887 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
1759.0 kg |
291521
|
ACETIC ACID |
2024-05-28 |
BANQ1058772683 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-05-28 |
BANQ1058953732 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
15342.0 kg |
392062
|
POLY ETCHANT 200L(SAS) |
2024-05-28 |
KWEO550141526733 |
SEH AMERICA |
39984.0 kg |
|
ETCHANT ETCHANT |
2024-05-26 |
BANQ1058771503 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
87935.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-05-19 |
JSSYJSDW2404008 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
52761.0 kg |
480220
|
PHOTO RESIST STRIPPERNEW ARF THINNER PHOTO RESIST STRIPPERNEW ARF THINNER PHOTO RESIST STRIPPERNEW ARF THINNER |
2024-05-16 |
BANQ1058770654 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
1759.0 kg |
291521
|
ACETIC ACID |
2024-05-15 |
BANQ1058502907 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
19760.0 kg |
721633
|
IPA MB-H 100L IPA MB-H 100L |
2024-05-11 |
JSSYJSDW2404004 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
18912.0 kg |
293213
|
ISO PROPYL ALCOHOL ISO PROPYL ALCOHOL |
2024-05-08 |
BANQ1058082432 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
52761.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-05-08 |
BANQ1058085073 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
52761.0 kg |
|
ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) ARF THINNER(RFM)200L(SAS) |
2024-05-08 |
BANQ1058419703 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
9880.0 kg |
721633
|
IPA MB-H 100L |
2024-04-29 |
JSSYJSDW2403001 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
87935.0 kg |
480220
|
PHOTO RESIST STRIPPERNEW ARF THINER PHOTO RESIST STRIPPERNEW ARF THINER PHOTO RESIST STRIPPERNEW ARF THINER PHOTO RESIST STRIPPERNEW ARF THINER PHOTO RESIST STRIPPERNEW ARF THINER |
2024-03-23 |
JSSYJSDW2402003 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
16438.0 kg |
|
ETCHANT |
2024-03-18 |
JSSYJSDW2402002 |
SUMITOMO CHEMICAL ADVANCED TECHNOLO |
9456.0 kg |
293213
|
ISO PROPYL ALCOHOL |
2024-03-13 |
KWEO550141500284 |
SEH AMERICA |
20798.0 kg |
|
ETCHANT |
2024-03-07 |
BANQ1057917370 |
SAMSUNG AUSTIN SEMICONDUCTOR LLC |
15342.0 kg |
392062
|
POLY ETCHANT 200L(SAS) |